HS code |
CIQ code |
HS System Commodity Name |
Gen Duty |
MFN Duty |
FTA Duty |
Excise Tax |
VAT |
Customs Clearance Code |
CIQ Inspection Code |
8486101000 |
|
Machines and apparatus for the treatment of monocrystalline sillicon by a process involving a change of temperature (used for the manufacture of boules or wafers)
利用温度变化处理单晶硅的机器及装置
|
30.0% |
0.0% |
0% ~ 0.0% |
0.0% |
13.0% |
无 |
无 |
8486102000 |
|
Grinding machines for the manufacture of boules or wafers
制造单晶柱或晶圆用的研磨设备
|
30.0% |
0.0% |
0% ~ 0.0% |
0.0% |
13.0% |
无 |
无 |
8486103000 |
|
Sawing machines for the manufacture of boules or wafers
制造单晶柱或晶圆用的切割设备
|
30.0% |
0.0% |
0% ~ 0.0% |
0.0% |
13.0% |
无 |
无 |
8486104000 |
|
Chemical mechanical polishers(CMP) for the manufacture of boules or wafers
制造单晶柱或晶圆用的化学机械抛光设备(CMP)
|
30.0% |
0.0% |
0% ~ 0.0% |
0.0% |
13.0% |
无 |
无 |
8486109000 |
|
Other machines and apparatus for the manufacture of boules or wafers
其他制造单晶柱或晶圆用的机器及装置
|
30.0% |
0.0% |
0% ~ 0.0% |
0.0% |
13.0% |
无 |
无 |
8486201000 |
|
Oxidation, diffusion, annealing and other heat treatment equipment for the manufacture of semiconductor devices or of electronic integrated circuis
氧化、扩散、退火及其他热处理设备
|
30.0% |
0.0% |
0% ~ 0.0% |
0.0% |
13.0% |
无 |
无 |
8486202100 |
|
Chemical Vapour Deposition(CVD)equipment for the manufacture of semiconductor devices or of electronic integrated circuis
制造半导体器件或集成电路用化学气相沉积装置
|
30.0% |
0.0% |
0% ~ 0.0% |
0.0% |
13.0% |
无 |
无 |
8486202200 |
|
Physical Vapour Deposition(PVD)equipment for the manufacture of semiconductor devices or of electronic integrated circuis
制造半导体器件或集成电路用物理气相沉积装置
|
30.0% |
0.0% |
0% ~ 0.0% |
0.0% |
13.0% |
无 |
无 |
8486202900 |
|
Other film deposition equipment for the manufacture of semiconductor devices or of electronic integrated circuis
其他制造半导体器件或集成电路用薄膜沉积设备
|
30.0% |
0.0% |
0% ~ 0.0% |
0.0% |
13.0% |
无 |
无 |
8486203100 |
|
Step and repeat aligners for the manufacture of semiconductor devices or of electronic integrated circuis
制造半导体器件或集成电路用分步重复光刻机
|
100.0% |
0.0% |
0% ~ 0.0% |
0.0% |
13.0% |
无 |
无 |
8486203900 |
|
Other apparatus for the projection or drawing of circuit patterns on sensitized semiconductor materials (for the manufacture of semiconductor devices or of electronic integrated circuis)
其他将电路图投影或绘制到感光半导体材料上的装置
|
100.0% |
0.0% |
0% ~ 0.0% |
0.0% |
13.0% |
无 |
无 |
8486204100 |
|
Dry plasma etching for the manufacture of semiconductor devices or of electronic integrated circuis
制造半导体器件或集成电路用等离子体干法刻蚀机
|
30.0% |
0.0% |
0% ~ 0.0% |
0.0% |
13.0% |
无 |
无 |
8486204900 |
|
Other etching and stripping equipment for the manufacture of semiconductor devices or of electronic integrated circuis
其他制造半导体器件或集成电路用刻蚀及剥离设备
|
30.0% |
0.0% |
0% ~ 0.0% |
0.0% |
13.0% |
无 |
无 |
8486205000 |
|
Ion implanters for the manufacture of semiconductor devices or of electronic integrated circuis
制造半导体器件或集成电路用离子注入机
|
11.0% |
0.0% |
0% ~ 0.0% |
0.0% |
13.0% |
无 |
无 |
8486209000 |
|
Other machines and apparatus for the manufacture of semiconductor devices or of electronic integrated circuis
其他制造半导体器件或集成电路用机器及装置
|
30.0% |
0.0% |
0% ~ 0.0% |
0.0% |
13.0% |
无 |
无 |
8486301000 |
|
Oxidation, diffusion, annealing and other heat treatment equipment for the manufacture of flat panel displays
制造平板显示器用扩散、氧化、退火及其他热处理设备
|
30.0% |
0.0% |
0% ~ 0.0% |
0.0% |
13.0% |
无 |
无 |
8486302100 |
|
Chemical Vapour Deposition(CVD)equipment for the manufacture of flat panel displays
制造平板显示器用化学气相沉积装置(CVD)
|
30.0% |
0.0% |
0% ~ 0.0% |
0.0% |
13.0% |
无 |
无 |
8486302200 |
|
Physical Vapour Deposition (PVD)equipment for the manufacture of flat panel displays
制造平板显示器用物理气相沉积装置(PVD)
|
30.0% |
0.0% |
0% ~ 0.0% |
0.0% |
13.0% |
无 |
无 |
8486302900 |
|
Other film deposition equipment for the manufacture of flat panel displays
其他制造平板显示器用薄膜沉积设备
|
30.0% |
0.0% |
0% ~ 0.0% |
0.0% |
13.0% |
无 |
无 |
8486303100 |
|
Step and repeat aligners for the manufacture of flat panel displays
制造平板显示器用分步重复光刻机
|
100.0% |
0.0% |
0% ~ 0.0% |
0.0% |
13.0% |
无 |
无 |